发明授权
US08699023B2 Reflectivity measuring device, reflectivity measuring method, membrane thickness measuring device, and membrane thickness measuring method 有权
反射率测量装置,反射率测量方法,膜厚测量装置和膜厚测量方法

  • 专利标题: Reflectivity measuring device, reflectivity measuring method, membrane thickness measuring device, and membrane thickness measuring method
  • 专利标题(中): 反射率测量装置,反射率测量方法,膜厚测量装置和膜厚测量方法
  • 申请号: US13822741
    申请日: 2011-09-14
  • 公开(公告)号: US08699023B2
    公开(公告)日: 2014-04-15
  • 发明人: Kenichi OhtsukaTetsuhisa Nakano
  • 申请人: Kenichi OhtsukaTetsuhisa Nakano
  • 申请人地址: JP Hamamatsu-shi, Shizuoka
  • 专利权人: Hamamatsu Photonics K.K.
  • 当前专利权人: Hamamatsu Photonics K.K.
  • 当前专利权人地址: JP Hamamatsu-shi, Shizuoka
  • 代理机构: Drinker Biddle & Reath LLP
  • 优先权: JP2010-209668 20100917
  • 国际申请: PCT/JP2011/071020 WO 20110914
  • 国际公布: WO2012/036213 WO 20120322
  • 主分类号: G01J3/28
  • IPC分类号: G01J3/28
Reflectivity measuring device, reflectivity measuring method, membrane thickness measuring device, and membrane thickness measuring method
摘要:
A reflectivity measuring device 1 includes a measurement light source 30 that supplies irradiation light L1 to a measurement object, a spectroscopic detection unit 80 that detects, at multi-wavelength, intensity of the irradiation light L1 and intensity of reflected light L2 from the measurement object, a coefficient recording unit 92 that records a conversion coefficient K(λ) for converting a detected value of each wavelength's intensity of the irradiation light L1 into a value corresponding to a detected value of each wavelength's intensity of reflected light L2 from a reference measurement object, and a reflectivity calculation unit 93 that calculates each wavelength's reflectivity based on the value corresponding to the each wavelength's intensity of the reflected light L2 from the reference measurement object obtained from the detected value of the each wavelength's intensity of the irradiation light L1 and the conversion coefficient K(λ).
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