发明授权
- 专利标题: Base makeup cosmetic and method for producing the same
- 专利标题(中): 基础化妆品及其制造方法
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申请号: US13578766申请日: 2011-01-21
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公开(公告)号: US08703162B2公开(公告)日: 2014-04-22
- 发明人: Kazuhiro Nakamura , Hideyasu Ishibashi
- 申请人: Kazuhiro Nakamura , Hideyasu Ishibashi
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2010-075550 20100329; JP2010-207214 20100915
- 国际申请: PCT/JP2011/051128 WO 20110121
- 国际公布: WO2011/122077 WO 20111006
- 主分类号: A61K8/02
- IPC分类号: A61K8/02 ; A61K8/00
摘要:
A base makeup cosmetic satisfying the relationship expressed by the following Formula (1) and the relationship expressed by the following Formula (2) and exhibiting a hue angle of the cosmetic in a range of from 40° to 80°, wherein, when incident light falls on a light-receiving surface from a direction at −45° relative to the light-receiving surface, the light-receiving surface being a surface of a coating layer obtained by applying the base makeup cosmetic, (C*45) and (angle h*45) respectively represent the chroma (C*45) and hue angle (angle h*45) of reflected light in a specular reflection direction (a direction at)45°; and, when incident light falls on the light-receiving surface from a direction at −45° relative to the light-receiving surface, (C*0) and (angle h*0) respectively represent the chroma (C*0) and hue angle (angle h*0) of reflected light in a diffuse reflection direction (a direction at 0°). (C*0)−(C*45)≦2.0 Formula (1) |(angle h*0)−(angle h*45)|≦1.5 Formula (2)
公开/授权文献
- US20120315314A1 BASE MAKEUP COSMETIC AND METHOD FOR PRODUCING THE SAME 公开/授权日:2012-12-13
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