发明授权
US08703581B2 Water soluble mask for substrate dicing by laser and plasma etch 有权
用于通过激光和等离子体蚀刻进行衬底切割的水溶性掩模

Water soluble mask for substrate dicing by laser and plasma etch
摘要:
Methods of dicing substrates having a plurality of ICs. A method includes forming a mask comprising a water soluble material layer over the semiconductor substrate. The mask is patterned with a femtosecond laser scribing process to provide a patterned mask with gaps. The patterning exposes regions of the substrate between the ICs. The substrate is then etched through the gaps in the patterned mask to singulate the IC and the water soluble material layer washed off.
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