Invention Grant
- Patent Title: X-ray analyzer and mapping method for an X-ray analysis
- Patent Title (中): X射线分析仪和X线分析的绘图方法
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Application No.: US13027881Application Date: 2011-02-15
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Publication No.: US08705698B2Publication Date: 2014-04-22
- Inventor: Hiroshi Matsumura , Kiyoshi Hasegawa
- Applicant: Hiroshi Matsumura , Kiyoshi Hasegawa
- Applicant Address: JP
- Assignee: SII Nanotechnology Inc.
- Current Assignee: SII Nanotechnology Inc.
- Current Assignee Address: JP
- Agency: Brinks Gilson & Lione
- Priority: JP2010-035233 20100219
- Main IPC: H05G1/62
- IPC: H05G1/62 ; G01N23/201 ; G06K9/78 ; G06K9/82

Abstract:
Provided are an X-ray analyzer and a mapping method for an X-ray analysis which, in a inspection for a harmful substance contained in, for example, a material or a composite electronic component, enable determination as to whether a sample is normal or abnormal to be performed visually based on an image obtained by the X-ray mapping analysis. In the X-ray analyzer, an X-ray mapping image of a sample which is confirmed to be normal in advance is obtained as a reference mapping image. A mapping analysis is performed on a inspection sample. A difference from the reference mapping image is obtained for each pixel, to thereby display a difference mapping image. A region in which the amount of specific element is larger than a reference amount is displayed with high brightness, and hence an abnormal portion may be easily found.
Public/Granted literature
- US20110206186A1 X-RAY ANALYZER AND MAPPING METHOD FOR AN X-RAY ANALYSIS Public/Granted day:2011-08-25
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