Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
-
Application No.: US11488171Application Date: 2006-07-18
-
Publication No.: US08707890B2Publication Date: 2014-04-29
- Inventor: Ivar Schram , Johan Frederik Dijksman , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers
- Applicant: Ivar Schram , Johan Frederik Dijksman , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B05C7/06
- IPC: B05C7/06

Abstract:
A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.
Public/Granted literature
- US20080018875A1 Imprint lithography Public/Granted day:2008-01-24
Information query