发明授权
- 专利标题: Method of manufacturing substrate for liquid discharge head
- 专利标题(中): 液体排出头用基板的制造方法
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申请号: US12721046申请日: 2010-03-10
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公开(公告)号: US08709266B2公开(公告)日: 2014-04-29
- 发明人: Satoshi Kokubo , Masahiko Kubota
- 申请人: Satoshi Kokubo , Masahiko Kubota
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2009-088965 20090401
- 主分类号: B41J2/14
- IPC分类号: B41J2/14 ; B44C1/22
摘要:
A method of manufacturing a substrate for a liquid discharge head having a supply port passing through a silicon substrate provided with an energy-generating element generating the energy used to discharge a liquid and allowing liquid to be supplied to the energy-generating element, includes preparing a silicon substrate in which a first etching mask having a first opening is provided on a first face, and a second etching mask having a second opening is provided on a second face that is the rear face of the first face; forming a first recess towards the second face from the first face within the first opening, and forming a second recess towards the first face from the second face within in the second opening; and performing crystalline anisotropic etching using the first and second etching masks as masks from both of the first and second faces, to form the supply port.
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