发明授权
- 专利标题: Inspection apparatus for lithography
- 专利标题(中): 光刻检验装置
-
申请号: US12933481申请日: 2009-04-08
-
公开(公告)号: US08724087B2公开(公告)日: 2014-05-13
- 发明人: Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
- 申请人: Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 国际申请: PCT/EP2009/002622 WO 20090408
- 国际公布: WO2009/127355 WO 20091022
- 主分类号: G03B27/54
- IPC分类号: G03B27/54
摘要:
A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal representative of the spectrum. The apparatus includes a beam shaper (51, 53) interposed in the radiation path between the radiation source and the detector, the beam shaper being configured to adjust the cross section of the beam dependent on the shape and/or size of the target.
公开/授权文献
- US20110141444A1 Inspection Apparatus for Lithography 公开/授权日:2011-06-16
信息查询