Invention Grant
US08726835B2 Chemical bath deposition apparatus for fabrication of semiconductor films 有权
用于制造半导体膜的化学浴沉积装置

  • Patent Title: Chemical bath deposition apparatus for fabrication of semiconductor films
  • Patent Title (中): 用于制造半导体膜的化学浴沉积装置
  • Application No.: US13172826
    Application Date: 2011-06-30
  • Publication No.: US08726835B2
    Publication Date: 2014-05-20
  • Inventor: Jiaxiong Wang
  • Applicant: Jiaxiong Wang
  • Main IPC: B05B1/02
  • IPC: B05B1/02 B05C11/00
Chemical bath deposition apparatus for fabrication of semiconductor films
Abstract:
A chemical bath deposition apparatus is presented to prepare different thin films on plane substrates. In particular, it is useful to deposit CdS or ZnS buffer layers in manufacture of thin film solar cells. This deposition apparatus deposits thin films onto vertically travelling plane workpieces delivered by a conveyor belt. The thin films are deposited with continuously spraying the reaction solutions from their freshly mixed styles to gradually aged forms until the designed thickness is obtained. The substrates and the solutions are heated to a reaction temperature. During the deposition processes, the front surfaces of the substrates are totally covered with the sprayed solutions but the substrate backsides are remained dry. The reaction ambience inside the reactor can be isolated from the outside atmosphere. The apparatus is designed to generate a minimum amount of waste solutions for chemical treatments.
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