发明授权
- 专利标题： Resist composition and method for producing resist pattern
- 专利标题（中）： 抗蚀剂组合物和抗蚀剂图案的制造方法
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申请号： US13551860申请日： 2012-07-18
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公开(公告)号： US08728707B2公开(公告)日： 2014-05-20
- 发明人: Koji Ichikawa , Satoshi Yamaguchi
- 申请人： Koji Ichikawa , Satoshi Yamaguchi
- 申请人地址： JP Tokyo
- 专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2011-157539 20110719
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38
摘要：
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23 and ring W21 are defined in the specification.
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