Invention Grant
US08728720B2 Arbitrary pattern direct nanostructure fabrication methods and system 有权
任意模式直接纳米结构制造方法和系统

Arbitrary pattern direct nanostructure fabrication methods and system
Abstract:
Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.
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