发明授权
- 专利标题: Interferometric measurement of displacement in axial direction of a grating
- 专利标题(中): 光栅轴向位移的干涉测量
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申请号: US13438615申请日: 2012-04-03
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公开(公告)号: US08730483B2公开(公告)日: 2014-05-20
- 发明人: Masato Ikeda , Katsuhiro Oyama
- 申请人: Masato Ikeda , Katsuhiro Oyama
- 申请人地址: JP Tokyo
- 专利权人: Taiyo Yuden Co., Ltd.
- 当前专利权人: Taiyo Yuden Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Chen Yoshimura LLP
- 优先权: JP2009-231845 20091005; JP2010-084081 20100331
- 主分类号: G01B9/02
- IPC分类号: G01B9/02
摘要:
A displacement measurement device includes a first diffraction grating that generates first diffraction light of a prescribed order; a second diffraction grating movable relative to the first diffraction grating, the second diffraction grating dividing the zeroth-order light that has passed through the first diffraction grating into zeroth-order light and a second diffraction light of a prescribed order; and a first optical sensor that detects interfering light beams formed by the first diffraction light from the first diffraction grating and the second diffraction light from the second diffraction grating to determine an amount of a displacement of the second diffraction grating relative to the first diffraction grating.