Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12948533Application Date: 2010-11-17
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Publication No.: US08730485B2Publication Date: 2014-05-20
- Inventor: Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra
- Applicant: Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G03B27/42 ; G03F7/20 ; G01D5/38

Abstract:
A position measurements system to measure a position of a movable object with respect to another object includes two or more one dimensional (1D) encoder heads mounted on one of the movable object and the other object and each capable of emitting a measurement beam along a measurement direction, one or more reference targets mounted on the other of the movable object and the other object, each reference target including a planar surface with a grid or grating to cooperate with the two or more one dimensional (1D) encoder heads, and a processor to calculate a position of the object on the basis of outputs of the two or more 1D encoder heads, wherein the measurement direction of each of the two or more 1D encoder heads is non-perpendicular to the planar surface of the respective reference target.
Public/Granted literature
- US20110116066A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-05-19
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