Invention Grant
- Patent Title: Carbonyl propyl sulfuryl anthrapyridone sulfonic acid compounds and their preparation methods and applications
- Patent Title (中): 羰基丙基磺酰基蒽吡啶酮磺酸化合物及其制备方法和应用
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Application No.: US13919996Application Date: 2013-06-17
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Publication No.: US08734580B2Publication Date: 2014-05-27
- Inventor: Xiaojun Peng , Jinhe Wu , Zhi Long , Rong Zhang , Licheng Liaoning , Feng Wang , Shaolei Li , Jiangli Fan , Fengling Song , Shiguo Sun
- Applicant: Dalian University of Technology , Zhuhai Ninestar Management, Co., Ltd.
- Applicant Address: CN Dalian CN Zhuhai
- Assignee: Dalian University of Technology,Zhuhai Ninestar Management Co., Ltd.
- Current Assignee: Dalian University of Technology,Zhuhai Ninestar Management Co., Ltd.
- Current Assignee Address: CN Dalian CN Zhuhai
- Agency: J.C. Patents
- Main IPC: C09D11/02
- IPC: C09D11/02 ; C07D221/18
Abstract:
The present invention relates to compounds shown in the general formula (I) or (III), the salts thereof or their mixtures, as well as their preparation method and application. In the general formula (I), X1 is H or CO2H; X2 is OH or phenyl group with 0-2 sulfonic acid substituents, and the sulfonic acid substituents are located at random positions of a benzene ring; when X2 is OH, X1 is H; when X2 is phenyl group with 0-2 sulfonic acid substituents, X1 is H or CO2H; n is an integer of 0-2; and in the general formula (III), n and m are respectively an integer of 0-2. The compounds and the mixtures not only have improved light resistance, ozone resistance and water resistance, but also have excellent water solubility and long-term stability in ink-jet ink.
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