Invention Grant
- Patent Title: Rotation position sensor
- Patent Title (中): 旋转位置传感器
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Application No.: US13173824Application Date: 2011-06-30
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Publication No.: US08736259B2Publication Date: 2014-05-27
- Inventor: Yuichi Manabe , Tetsuji Inoue
- Applicant: Yuichi Manabe , Tetsuji Inoue
- Applicant Address: JP Obu-Shi
- Assignee: Aisan Kogyo Kabushiki Kaisha
- Current Assignee: Aisan Kogyo Kabushiki Kaisha
- Current Assignee Address: JP Obu-Shi
- Agency: Oliff PLC
- Priority: JP2010-155844 20100708
- Main IPC: G01B7/30
- IPC: G01B7/30

Abstract:
A rotational position sensor includes a rotor substrate and a stator substrate placed to face each other to detect rotational displacement of the rotor substrate. The rotor substrate is formed with an excitation coil in a meandering pattern on an outer circumferential side and a rotor-side rotary transformer on an inner circumferential side. The stator substrate is formed with four detection coils in a meandering pattern on an outer circumferential side and a stator-side rotary transformer on an inner circumferential side. The four detection coils are arranged in a circumferential direction without overlapping each other. The detection coils are displaced from each other by 360°/8. The rotational position sensor includes a high frequency excitation circuit for applying a high frequency signal to the excitation coil through the rotor-side rotary transformer and the rotor-side rotary transformer to excite the excitation coil.
Public/Granted literature
- US20120007592A1 ROTATION POSITION SENSOR Public/Granted day:2012-01-12
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