The present disclosure provides an integrated circuit design method in many different embodiments. An exemplary IC design method comprises providing an IC design layout of a circuit in a first technology node; migrating the IC design layout of the circuit to a second technology node; applying an electrical patterning (ePatterning) modification to the migrated IC design layout according to an electrical parameter of the circuit; and thereafter fabricating a mask according to the migrated IC design layout of the circuit in the second technology node.