Invention Grant
- Patent Title: Electrostatic lens array
- Patent Title (中): 静电透镜阵列
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Application No.: US13915834Application Date: 2013-06-12
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Publication No.: US08748842B2Publication Date: 2014-06-10
- Inventor: Yasuo Ohashi
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2012-140610 20120622
- Main IPC: G21K1/08
- IPC: G21K1/08

Abstract:
Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in a travelling direction of the charged particle beam, a peripheral contour line formed by any one of surfaces of the multiple substrates other than an upper surface of a most upstream substrate and a lower surface of a most downstream substrate has a protruding portion protruding from a peripheral contour line of one of the upper surface of the most upstream substrate and the lower surface of the most downstream substrate; and a position of the protruding portion is defined by a position regulating member, whereby parallelism is adjustable so that a surface including the protruding portion is parallel to a surface to be irradiated with the charged particle beam after passing through the aperture.
Public/Granted literature
- US20130341526A1 ELECTROSTATIC LENS ARRAY Public/Granted day:2013-12-26
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