Invention Grant
US08758962B2 Method and apparatus for sub-pellicle defect reduction on photomasks
有权
在光掩模上进行亚防护薄膜缺陷减少的方法和装置
- Patent Title: Method and apparatus for sub-pellicle defect reduction on photomasks
- Patent Title (中): 在光掩模上进行亚防护薄膜缺陷减少的方法和装置
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Application No.: US13443427Application Date: 2012-04-10
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Publication No.: US08758962B2Publication Date: 2014-06-24
- Inventor: Jay S. Burnham , Frances A. Houle , Louis M. Kindt
- Applicant: Jay S. Burnham , Frances A. Houle , Louis M. Kindt
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Richard Kotulak
- Main IPC: G03F1/48
- IPC: G03F1/48 ; G03F1/20
Abstract:
In one embodiment, the invention is a method and apparatus for sub-pellicle defect reduction on photomasks. One embodiment of a photomask for use in photolithography includes a substrate on which a pattern is formed, the substrate having a frontside and an opposite backside, and a protective coating formed on at least one of the frontside and the backside, the protective coating comprising silicon-based compound.
Public/Granted literature
- US20120196212A1 METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS Public/Granted day:2012-08-02
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