发明授权
- 专利标题： Chamber apparatus and extreme ultraviolet light generation system
- 专利标题（中）： 室内设备和极紫外光发生系统
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申请号： US13122354申请日： 2011-03-11
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公开(公告)号： US08759804B2公开(公告)日： 2014-06-24
- 发明人: Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
- 申请人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
- 申请人地址： JP Tochigi
- 专利权人： Gigaphoton Inc.
- 当前专利权人： Gigaphoton Inc.
- 当前专利权人地址： JP Tochigi
- 代理机构： McDermott Will & Emery LLP
- 优先权： JP2010-063359 20100318; JP2010-288902 20101224
- 国际申请： PCT/JP2011/056483 WO 20110311
- 国际公布： WO2011/115233 WO 20110922
- 主分类号： A61N5/06
- IPC分类号： A61N5/06 ; G01J3/10 ; H05G2/00
摘要：
A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
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