Invention Grant
US08762900B2 Method for proximity correction 有权
邻近校正方法

Method for proximity correction
Abstract:
A method of an integrated circuit (IC) design includes receiving an IC design layout. The IC design layout includes an IC feature with a first outer boundary and a first target points assigned to the first outer boundary. The method also includes generating a second outer boundary for the IC feature and moving all the first target points to the second outer boundary to form a modified IC design layout.
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