发明授权
- 专利标题： Patterning method
- 专利标题（中）： 图案化方法
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申请号： US13720162申请日： 2012-12-19
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公开(公告)号： US08765362B2公开(公告)日： 2014-07-01
- 发明人: Tomoya Oori
- 申请人： Tomoya Oori
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
According to one embodiment, a patterning method includes exposure-transferring a plurality of first island pattern images and a plurality of second island pattern images onto a resist film, each of the plurality of first island pattern images having a configuration having a contour line or a major axis extending in a third direction, the plurality of first island pattern images having a staggered arrangement, each of the plurality of second island pattern images having a configuration having a contour line or a major axis extending in a fourth direction, the plurality of second island pattern images having a staggered arrangement, the first island pattern images and the second island pattern images being continuous in the first direction by a portion of each of the second island pattern images overlapping one of the first island pattern images.
公开/授权文献
- US20140065556A1 PATTERNING METHOD 公开/授权日：2014-03-06
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