Invention Grant
US08766234B1 Current selector for non-volatile memory in a cross bar array based on defect and band engineering metal-dielectric-metal stacks
有权
基于缺陷和带工程金属 - 电介质金属叠层的交叉条阵列中的非易失性存储器的当前选择器
- Patent Title: Current selector for non-volatile memory in a cross bar array based on defect and band engineering metal-dielectric-metal stacks
- Patent Title (中): 基于缺陷和带工程金属 - 电介质金属叠层的交叉条阵列中的非易失性存储器的当前选择器
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Application No.: US13728860Application Date: 2012-12-27
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Publication No.: US08766234B1Publication Date: 2014-07-01
- Inventor: Imran Hashim , Venkat Ananthan , Tony P. Chiang , Prashant B. Phatak
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L45/00

Abstract:
Selector devices that can be suitable for memory device applications can have low leakage currents at low voltages to reduce sneak current paths for non selected devices, and high leakage currents at high voltages to minimize voltage drops during device switching. In some embodiments, the selector device can include a first electrode, a tri-layer dielectric layer, and a second electrode. The tri-layer dielectric layer can include a high leakage dielectric layer sandwiched between two lower leakage dielectric layers. The low leakage layers can function to restrict the current flow across the selector device at low voltages. The high leakage dielectric layer can function to enhance the current flow across the selector device at high voltages.
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