发明授权
- 专利标题: Composite semiconductor device
- 专利标题(中): 复合半导体器件
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申请号: US13574993申请日: 2010-12-28
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公开(公告)号: US08766275B2公开(公告)日: 2014-07-01
- 发明人: Naoyasu Iketani , Tomohiro Nozawa , Yoshiaki Nozaki , John K. Twynam , Hiroshi Kawamura , Keiichi Sakuno
- 申请人: Naoyasu Iketani , Tomohiro Nozawa , Yoshiaki Nozaki , John K. Twynam , Hiroshi Kawamura , Keiichi Sakuno
- 申请人地址: JP Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JP Osaka
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2010-013083 20100125; JP2010-182165 20100817
- 国际申请: PCT/JP2010/073691 WO 20101228
- 国际公布: WO2011/089837 WO 20110728
- 主分类号: H01L31/0256
- IPC分类号: H01L31/0256
摘要:
This composite semiconductor device has a normally-on first field effect transistor and a normally-off second field effect transistor connected in series between first and second terminals, gates of the first and second field effect transistors being connected to second and third terminals, respectively, and N diodes being connected in series in a forward direction between a drain and a source of the second field effect transistor. Therefore, a drain-source voltage (Vds) of the second field effect transistor can be restricted to a voltage not higher than a withstand voltage of the second field effect transistor.
公开/授权文献
- US20120292635A1 COMPOSITE SEMICONDUCTOR DEVICE 公开/授权日:2012-11-22
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