发明授权
- 专利标题： Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷装置，用于光刻设备的流体处理结构和装置制造方法
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申请号： US13109036申请日： 2011-05-17
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公开(公告)号： US08767169B2公开(公告)日： 2014-07-01
- 发明人: Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
- 申请人： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/32
- IPC分类号： G03B27/32 ; G03B27/52 ; G03B27/58 ; G03F7/20
摘要：
A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.