Invention Grant
- Patent Title: Substrate processing apparatus and substrate processing system
- Patent Title (中): 基板加工装置及基板处理系统
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Application No.: US13571418Application Date: 2012-08-10
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Publication No.: US08768502B2Publication Date: 2014-07-01
- Inventor: Yoshihiko Nakagawa
- Applicant: Yoshihiko Nakagawa
- Applicant Address: JP Tokyo
- Assignee: Hitachi Kokusai Electric Inc.
- Current Assignee: Hitachi Kokusai Electric Inc.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2008-068744 20080318; JP2008-333129 20081226
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
To provide a substrate processing system which can cause different display portions to output different displays, and cause different operations to be carried out from different operation screens. A substrate processing system, on login information of a user being input from a main display device, refers to the login information, a user group parameter, with which is set a group to which the user belongs, and an authority parameter, which sets an authority of the group, and causes the main display device to display a main operation screen corresponding to the user, while it, on login information of a user being input from an external operating apparatus, causes an external display device to display an external parameter setting screen for setting an authority parameter of a group to which the user belongs, or to display an external operation screen corresponding to the group to which the user belongs.
Public/Granted literature
- US20130046403A1 Substrate Processing Apparatus and Substrate Processing System Public/Granted day:2013-02-21
Information query