发明授权
- 专利标题: Anti-microbial substrates with peroxide treatment
- 专利标题(中): 用过氧化物处理的抗微生物底物
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申请号: US11847976申请日: 2007-08-30
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公开(公告)号: US08778386B2公开(公告)日: 2014-07-15
- 发明人: Kou-Chang Liu , David W. Koenig , Ali Yahiaoui , Alison Salyer Bagwell
- 申请人: Kou-Chang Liu , David W. Koenig , Ali Yahiaoui , Alison Salyer Bagwell
- 申请人地址: US WI Neenah
- 专利权人: Kimberly-Clark Worldwide, Inc.
- 当前专利权人: Kimberly-Clark Worldwide, Inc.
- 当前专利权人地址: US WI Neenah
- 代理机构: Dority & Manning, P.A.
- 主分类号: A61F13/00
- IPC分类号: A61F13/00 ; A61K33/40
摘要:
An oxidizing anti-microbial treatment and products containing such treatment are described. The treatment involves, in part, preparing a substrate to accept an attachment of charged moieties, and a number of stabilized peroxide compounds on at least part of a surface of said substrate. When microbes, such as bacteria, having a net charge opposite to that of the charged moieties come in close proximity to the treated substrate surface, peroxide molecules from the substrate are activated and released to kill the microbes.
公开/授权文献
- US20080138373A1 Anti-Microbial Substrates With Peroxide Treatment 公开/授权日:2008-06-12
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