Invention Grant
- Patent Title: Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector
- Patent Title (中): 电子束检测器,电子束处理装置和电子束检测器的制造方法
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Application No.: US13968022Application Date: 2013-08-15
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Publication No.: US08779378B2Publication Date: 2014-07-15
- Inventor: Kenji Abe , Masaki Kurokawa , Akiyoshi Tsuda , Hideki Nasuno
- Applicant: Advantest Corporation
- Applicant Address: JP Tokyo
- Assignee: Advantest Corp.
- Current Assignee: Advantest Corp.
- Current Assignee Address: JP Tokyo
- Agency: Muramatsu & Associates
- Priority: JP2012-189899 20120830
- Main IPC: H01J49/00
- IPC: H01J49/00 ; H01J37/244 ; H01J9/00 ; G01N23/00 ; G01N7/00

Abstract:
There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.
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