Invention Grant
- Patent Title: Charged particle beam apparatus permitting high-resolution and high-contrast observation
- Patent Title (中): 带电粒子束装置允许高分辨率和高对比度观察
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Application No.: US13871624Application Date: 2013-04-26
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Publication No.: US08785890B2Publication Date: 2014-07-22
- Inventor: Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Stites & Harbison, PLLC.
- Agent Nicholas Trenkle, Esq.
- Priority: JP2008-104232 20080414
- Main IPC: A61N5/00
- IPC: A61N5/00 ; G21G5/00

Abstract:
A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.
Public/Granted literature
- US20130228701A1 CHARGED PARTICLE BEAM APPARATUS PERMITTING HIGH RESOLUTION AND HIGH-CONTRAST OBSERVATION Public/Granted day:2013-09-05
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