发明授权
- 专利标题: Method for making light emitting diode
- 专利标题(中): 制造发光二极管的方法
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申请号: US13479232申请日: 2012-05-23
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公开(公告)号: US08790940B2公开(公告)日: 2014-07-29
- 发明人: Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen , Shou-Shan Fan
- 申请人: Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen , Shou-Shan Fan
- 申请人地址: CN Beijing TW New Taipei
- 专利权人: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- 当前专利权人: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- 当前专利权人地址: CN Beijing TW New Taipei
- 代理机构: Novak Druce Connolly Bove + Quigg LLP
- 优先权: CN201110395474 20111203
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L33/00
摘要:
A method for making light emitting diode includes the following steps. A substrate is provided. A first semiconductor layer is grown on a surface of the substrate. A patterned mask layer is located on a surface of the first semiconductor layer, and the patterned mask layer includes a number of bar-shaped protruding structures, a slot is defined between each two adjacent protruding structures to expose a portion of the first semiconductor layer. The exposed first semiconductor layer is etched to form a protruding pair. A number of three-dimensional nano-structures are formed. An active layer and a second semiconductor layers are grown on the number of three-dimensional nano-structures in that order. The substrate is removed and a surface of the first semiconductor layer is exposed. A first electrode is applied to cover the exposed surface. A second electrode is electrically connected with the second semiconductor layer.
公开/授权文献
- US20130143341A1 METHOD FOR MAKING LIGHT EMITTING DIODE 公开/授权日:2013-06-06
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