Invention Grant
- Patent Title: Method for molecular bonding of silicon and glass substrates
- Patent Title (中): 硅和玻璃基板的分子键合方法
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Application No.: US13953679Application Date: 2013-07-29
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Publication No.: US08790993B2Publication Date: 2014-07-29
- Inventor: Sebastien Kerdiles , Daniel Delprat
- Applicant: SOITEC
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR1058299 20101012
- Main IPC: H01L21/30
- IPC: H01L21/30 ; H01L21/46

Abstract:
A method for bonding a first substrate having a first surface to a second substrate having a second surface. This method includes the steps of holding the first substrate by at least two support points, positioning the first substrate and the second substrate so that the first surface and the second surface face each other, deforming the first substrate by applying between at least one pressure point and the two support points a strain toward the second substrate, bringing the deformed first surface and the second surface into contact, and progressively releasing the strain to facilitate bonding of the substrates while minimizing or avoiding the trapping of air bubbles between the substrates.
Public/Granted literature
- US20130309841A1 METHOD FOR MOLECULAR BONDING OF SILICON AND GLASS SUBSTRATES Public/Granted day:2013-11-21
Information query
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