Invention Grant
US08791169B2 Fluorene-based resin polymer and photo-sensitive resin composition comprising the same
有权
芴系树脂聚合物及含有该树脂的感光性树脂组合物
- Patent Title: Fluorene-based resin polymer and photo-sensitive resin composition comprising the same
- Patent Title (中): 芴系树脂聚合物及含有该树脂的感光性树脂组合物
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Application No.: US13360057Application Date: 2012-01-27
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Publication No.: US08791169B2Publication Date: 2014-07-29
- Inventor: Yoon Hee Heo , Kwang Han Park , Han Soo Kim , Changho Cho , Sunhwa Kim , Won Jin Chung
- Applicant: Yoon Hee Heo , Kwang Han Park , Han Soo Kim , Changho Cho , Sunhwa Kim , Won Jin Chung
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: KR10-2011-0008330 20110127
- Main IPC: B29C71/04
- IPC: B29C71/04 ; C08F2/46 ; C08G61/04
Abstract:
The present invention relates to a fluorene-based resin polymer, and a photosensitive resin composition including the same, and the fluorene-based resin polymer according to the exemplary embodiment of the present invention has a high molecular weight, a low acid value, and excellent developing property, adhesive property and stability.
Public/Granted literature
- US20120196949A1 FLUORENE-BASED RESIN POLYMER AND PHOTO-SENSITIVE RESIN COMPOSITION COMPRISING THE SAME Public/Granted day:2012-08-02
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