Invention Grant
US08791290B2 Acetal compound, polymer, resist composition, and patterning process
有权
乙缩醛化合物，聚合物，抗蚀剂组合物和图案化工艺
- Patent Title: Acetal compound, polymer, resist composition, and patterning process
- Patent Title (中): 乙缩醛化合物，聚合物，抗蚀剂组合物和图案化工艺
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Application No.: US13069824Application Date: 2011-03-23
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Publication No.: US08791290B2Publication Date: 2014-07-29
- Inventor: Koji Hasegawa , Jun Hatakeyama , Takeshi Nagata , Seiichiro Tachibana , Takeshi Kinsho
- Applicant: Koji Hasegawa , Jun Hatakeyama , Takeshi Nagata , Seiichiro Tachibana , Takeshi Kinsho
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2010-067769 20100324
- Main IPC: C07C67/02
- IPC: C07C67/02
Abstract:
The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal.
Public/Granted literature
- US20110236831A1 ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2011-09-29
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