发明授权
- 专利标题： Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method
- 专利标题（中）： 含氟磺酸盐，含氟磺酸盐树脂，抗蚀剂组合物和图案形成方法
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申请号： US13565259申请日： 2012-08-02
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公开(公告)号： US08791293B2公开(公告)日： 2014-07-29
- 发明人: Kazunori Mori , Satoru Narizuka , Fumihiro Amemiya , Masaki Fujiwara
- 申请人： Kazunori Mori , Satoru Narizuka , Fumihiro Amemiya , Masaki Fujiwara
- 申请人地址： JP Ube-shi
- 专利权人： Central Glass Company, Limited
- 当前专利权人： Central Glass Company, Limited
- 当前专利权人地址： JP Ube-shi
- 代理机构： Crowell & Moring LLP
- 优先权： JP2011-196308 20110908; JP2012-155862 20120711
- 主分类号： C07C309/10
- IPC分类号： C07C309/10 ; C07C309/06 ; C07C303/22 ; G03F7/004
摘要：
According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.