Invention Grant
- Patent Title: Dynamic focus adjustment with optical height detection apparatus in electron beam system
- Patent Title (中): 电子束系统中光学高度检测装置的动态聚焦调整
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Application No.: US12764902Application Date: 2010-04-21
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Publication No.: US08791414B2Publication Date: 2014-07-29
- Inventor: Joe Wang , Van-Duc Nguyen , Yi-Xiang Wang , Jack Jau , Zhongwei Chen
- Applicant: Joe Wang , Van-Duc Nguyen , Yi-Xiang Wang , Jack Jau , Zhongwei Chen
- Applicant Address: TW Hsin-Chu
- Assignee: Hermes Microvision, Inc.
- Current Assignee: Hermes Microvision, Inc.
- Current Assignee Address: TW Hsin-Chu
- Agency: WPAT, PC
- Agent Justin King
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
The present invention generally relates to dynamic focus adjustment for an image system. With the assistance of a height detection sub-system, present invention provides an apparatus and methods for micro adjusting an image focusing according the specimen surface height variation by altering the field strength of an electrostatic lens between objective lens and sample stage/or a bias voltage applied to the sample surface. Merely by way of example, the invention has been applied to a scanning electron inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as observation tool with a height detection apparatus.
Public/Granted literature
- US20110260055A1 Dynamic Focus Adjustment with Optical Height Detection Apparatus in Electron Beam system Public/Granted day:2011-10-27
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