Invention Grant
- Patent Title: Thin film transistor substrate including a fluorine layer in an active pattern
- Patent Title (中): 薄膜晶体管基板包括活性图案中的氟层
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Application No.: US13693423Application Date: 2012-12-04
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Publication No.: US08791460B2Publication Date: 2014-07-29
- Inventor: Dae-Ho Kim , Hyun-Jae Na , Yong-Su Lee , Myoung-Geun Cha , Yoon-Ho Khang , Sang-Gab Kim , Jae-Neung Kim , Se-Hwan Yu
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2012-0091815 20120822
- Main IPC: H01L29/10
- IPC: H01L29/10

Abstract:
A thin film transistor substrate includes a base substrate, an active pattern, a gate insulation pattern and a gate electrode. The active pattern is disposed on the base substrate. The active pattern includes a source electrode, a drain electrode, and a channel disposed between the source electrode and the drain electrode. The gate insulation pattern and the gate electrode overlap with the channel. The gate insulation pattern is disposed between the channel and the gate electrode. The source electrode and the drain electrode each include a fluorine deposition layer.
Public/Granted literature
- US20140054579A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2014-02-27
Information query
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