发明授权
US08792078B2 Method and pellicle mounting apparatus for reducing pellicle induced distortion
有权
用于减少防护薄膜引起的畸变的方法和防护薄膜安装装置
- 专利标题: Method and pellicle mounting apparatus for reducing pellicle induced distortion
- 专利标题(中): 用于减少防护薄膜引起的畸变的方法和防护薄膜安装装置
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申请号: US12767152申请日: 2010-04-26
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公开(公告)号: US08792078B2公开(公告)日: 2014-07-29
- 发明人: Cheng-Ming Lin , Chien-Chao Huang , Jong-Yuh Chang , Chia-Wei Chang , Boming Hsu
- 申请人: Cheng-Ming Lin , Chien-Chao Huang , Jong-Yuh Chang , Chia-Wei Chang , Boming Hsu
- 申请人地址: TW
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW
- 代理机构: Lowe Hauptman & Ham, LLP
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
An apparatus for mounting a pellicle onto a mask is provided. In one embodiment, the apparatus comprises a base provided with a track; a dummy plate holder coupled to the base, the dummy plate holder for receiving a dummy plate having an elevated portion on one side thereof; a mask holder for receiving a mask, the mask holder slidably coupled to the base; a pellicle holder for receiving a pellicle frame, the pellicle holder slidably coupled to the base; and drive means being adapted to drive the pellicle holder along the track towards the dummy plate holder, wherein during operation when the pellicle frame is mounted onto the mask causing the mask to contact the dummy plate, the mounting pressure in the mask is distributed by way of the elevated portion in the dummy plate, thus reducing distortion in the mask.
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