Invention Grant
US08796660B2 Nonvolatile memory element comprising a resistance variable element and a diode
有权
非易失性存储元件包括电阻可变元件和二极管
- Patent Title: Nonvolatile memory element comprising a resistance variable element and a diode
- Patent Title (中): 非易失性存储元件包括电阻可变元件和二极管
-
Application No.: US12375881Application Date: 2007-09-21
-
Publication No.: US08796660B2Publication Date: 2014-08-05
- Inventor: Takeshi Takagi , Takumi Mikawa
- Applicant: Takeshi Takagi , Takumi Mikawa
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-281081 20061016
- International Application: PCT/JP2007/068392 WO 20070921
- International Announcement: WO2008/047530 WO 20080424
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L47/00 ; H01L29/04 ; H01L29/06 ; H01L29/08 ; H01L31/0352 ; H01L45/00 ; H01L27/24 ; H01L27/10 ; H01L21/00 ; G11C11/00

Abstract:
A nonvolatile memory element (20) of the present invention comprises a resistance variable element (14) and a diode (18) which are formed on a substrate (10) such that the resistance variable element (14) has a resistance variable layer (11) sandwiched between a lower electrode (12) and an upper electrode (13), and the diode (18) which is connected in series with the resistance variable element (14) in the laminating direction and has an insulating layer or semiconductor layer (15) sandwiched between a first electrode (16) at the lower side and a second electrode (17) at the upper side. The resistance variable layer (11) is embedded in a first contact hole (21) formed on the lower electrode (12). A first area (22) where insulating layer or semiconductor layer (15) of the diode (18) is in contact with a first electrode (16) of the diode (18) is larger than at least one of a second area (23) where the resistance variable layer (11) is in contact with the upper electrode (13) and a third area (24) where the resistance variable layer (11) is in contact with the lower electrode (12).
Public/Granted literature
- US20090321711A1 NONVOLATILE MEMORY ELEMENT AND MANUFACTURING METHOD THEREOF Public/Granted day:2009-12-31
Information query
IPC分类: