发明授权
- 专利标题: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
- 专利标题(中): 检测方法和装置,光刻设备,光刻处理单元和器件制造方法
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申请号: US12993460申请日: 2009-05-26
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公开(公告)号: US08797509B2公开(公告)日: 2014-08-05
- 发明人: Olav Johannes Seijger , Martinus Joseph Kok , Sander Kerssemakers , Mark Johannes Magielsen
- 申请人: Olav Johannes Seijger , Martinus Joseph Kok , Sander Kerssemakers , Mark Johannes Magielsen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 国际申请: PCT/EP2009/056365 WO 20090526
- 国际公布: WO2009/144218 WO 20091203
- 主分类号: G03B27/58
- IPC分类号: G03B27/58
摘要:
A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing elements. This can be achieved by using a hinge. This structure of substrate table positioning device has a higher lowest Eigen frequency of oscillation than that of substrate table positioning devices supported by three bearing elements. As such, the balance mass is not excited by typical vibrations that occur in the lithographic apparatus. This enables better positional control of the substrate table. It also enables at least some of the dimensions of the frame elements of the balance mass to be reduced.
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