发明授权
- 专利标题: Methods of making jogged layout routings double patterning compliant
- 专利标题(中): 制作慢跑布局布线的方法双重图案化
-
申请号: US13418895申请日: 2012-03-13
-
公开(公告)号: US08802574B2公开(公告)日: 2014-08-12
- 发明人: Lei Yuan , Jongwook Kye
- 申请人: Lei Yuan , Jongwook Kye
- 申请人地址: KY Grand Cayman
- 专利权人: GLOBALFOUNDRIES Inc.
- 当前专利权人: GLOBALFOUNDRIES Inc.
- 当前专利权人地址: KY Grand Cayman
- 代理机构: Amerson Law Firm, PLLC
- 主分类号: H01L21/302
- IPC分类号: H01L21/302
摘要:
One illustrative method disclosed herein involves creating an overall target pattern that includes an odd-jogged feature with a crossover region that connects first and second line portions, wherein the crossover region has a first dimension in a first direction that is greater than a second dimension that is transverse to the first direction, decomposing the overall target pattern into a first sub-target pattern and a second sub-target pattern, wherein each of the sub-target patterns comprise a line portion and a first portion of the crossover region, and generating first and second sets of mask data corresponding to the first and second sub-target patterns, respectively.