发明授权
- 专利标题: Photoelectric conversion device and manufacturing method thereof
- 专利标题(中): 光电转换装置及其制造方法
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申请号: US12476645申请日: 2009-06-02
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公开(公告)号: US08802972B2公开(公告)日: 2014-08-12
- 发明人: Min-Seok Oh , Jung-Tae Kim , Nam-Kyu Song , Min Park , Yun-Seok Lee , Czang-Ho Lee , Myung-Hun Shin , Byoung-Kyu Lee , Yuk-Hyun Nam , Seung-Jae Jung , Mi-Hwa Lim , Joon-Young Seo , Dong-Uk Choi , Dong-Seop Kim , Byoung-June Kim
- 申请人: Min-Seok Oh , Jung-Tae Kim , Nam-Kyu Song , Min Park , Yun-Seok Lee , Czang-Ho Lee , Myung-Hun Shin , Byoung-Kyu Lee , Yuk-Hyun Nam , Seung-Jae Jung , Mi-Hwa Lim , Joon-Young Seo , Dong-Uk Choi , Dong-Seop Kim , Byoung-June Kim
- 申请人地址: KR Yongin-Si, Gyeonggi-Do
- 专利权人: Samsung SDI Co., Ltd.
- 当前专利权人: Samsung SDI Co., Ltd.
- 当前专利权人地址: KR Yongin-Si, Gyeonggi-Do
- 代理机构: Lee & Morse, P.C.
- 优先权: KR10-2008-0133646 20081224
- 主分类号: H01L31/0224
- IPC分类号: H01L31/0224 ; H01L31/0376 ; H01L31/0368 ; H01L31/068 ; H01L31/078
摘要:
Disclosed herein is a photoelectric conversion device having a semiconductor substrate including a front side and back side, a protective layer formed on the front side of the semiconductor substrate, a first non-single crystalline semiconductor layer formed on the back side of the semiconductor substrate, a first conductive layer including a first impurity formed on a first portion of a back side of the first non-single crystalline semiconductor layer, and a second conductive layer including the first impurity and a second impurity formed on a second portion of the back side of the first non-single crystalline semiconductor layer.
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