Invention Grant
- Patent Title: Laser apparatus, extreme ultraviolet light generation system including the laser apparatus, and method for controlling the laser apparatus
- Patent Title (中): 激光装置，包括激光装置的极紫外光发生系统和用于控制激光装置的方法
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Application No.: US13696497Application Date: 2012-02-08
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Publication No.: US08811436B2Publication Date: 2014-08-19
- Inventor: Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
- Applicant: Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc
- Current Assignee: Gigaphoton Inc
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-040909 20110225; JP2011-277208 20111219
- International Application: PCT/IB2012/000222 WO 20120208
- International Announcement: WO2012/114172 WO 20120830
- Main IPC: H01S3/13
- IPC: H01S3/13
Abstract:
A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.
Public/Granted literature
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