发明授权
- 专利标题: Defect inspection method and device thereof
- 专利标题(中): 缺陷检查方法及其装置
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申请号: US13141375申请日: 2009-10-22
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公开(公告)号: US08811712B2公开(公告)日: 2014-08-19
- 发明人: Shunji Maeda , Kaoru Sakai , Hidetoshi Nishiyama
- 申请人: Shunji Maeda , Kaoru Sakai , Hidetoshi Nishiyama
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2008-330894 20081225
- 国际申请: PCT/JP2009/005561 WO 20091022
- 国际公布: WO2010/073453 WO 20100701
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
The invention provides a defect inspection method and a defect inspection device which enable a defect to be inspected regardless of optical conditions. The invention comprises the steps of setting a target local region and a plurality of corresponding local regions in the image signals, the target local region including a target pixel and an area surrounding the target pixel, the corresponding local regions including pixels corresponding to the target pixel and areas surrounding the corresponding pixels; searching similarities between the image signal of the target local region and the image signals of the plurality of corresponding local regions; determining a plurality of image signals that represent corresponding local regions and are similar to the image signal of the target local region; and comparing the image signal of the target local region with the image signals that represent the corresponding local regions.
公开/授权文献
- US20110274342A1 DEFECT INSPECTION METHOD AND DEVICE THEREOF 公开/授权日:2011-11-10
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