发明授权
- 专利标题: InP single crystal wafer and method for producing InP single crystal
- 专利标题(中): InP单晶晶片及其制造方法
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申请号: US11587698申请日: 2005-02-15
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公开(公告)号: US08815010B2公开(公告)日: 2014-08-26
- 发明人: Akira Noda , Ryuichi Hirano
- 申请人: Akira Noda , Ryuichi Hirano
- 申请人地址: JP Tokyo
- 专利权人: Nippon Mining & Metals Co., Ltd.
- 当前专利权人: Nippon Mining & Metals Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2004-132661 20040428
- 国际申请: PCT/JP2005/002223 WO 20050215
- 国际公布: WO2005/106083 WO 20051110
- 主分类号: C01B25/08
- IPC分类号: C01B25/08 ; C30B15/10 ; C30B27/02 ; C01B25/00 ; C30B15/00
摘要:
A method for producing a low-dislocation InP single crystal suitably used for an optical device such as a semiconductor laser, and the low-dislocation InP single crystal wafer are provided. In a liquid-encapsulated Czochralski method in which a semiconductor raw material and an encapsulant are contained in a raw material melt containing part comprising a cylindrical crucible having a bottom, the raw material containing part is heated to melt the raw material, and a seed crystal is brought into contact with a surface of a melt of the raw material in a state of being covered with the encapsulant to grow a crystal while the seed crystal is raised; a crystal shoulder part is grown from the seed crystal by setting a temperature gradient in a crystal growth direction to 25° C./cm or less and setting a temperature-fall amount to 0.25° C./hr or more. Thus, an iron-doped or undoped InP single crystal wafer in which an area having a dislocation density of 500/cm2 or less occupies 70% or more is realized.
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