Invention Grant
- Patent Title: Transistor with reduced depletion field width
- Patent Title (中): 具有减少耗尽场宽度的晶体管
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Application No.: US13751467Application Date: 2013-01-28
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Publication No.: US08816447B2Publication Date: 2014-08-26
- Inventor: Shuang Meng , Garo J. Derderian , Gurtej S. Sandhu
- Applicant: Round Rock Resarch, LLC
- Applicant Address: US NJ Jersey City
- Assignee: Round Rock Research, LLC
- Current Assignee: Round Rock Research, LLC
- Current Assignee Address: US NJ Jersey City
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119

Abstract:
Devices such as transistors having an oxide layer that provide a depletion field in a conduction channel. A barrier layer is formed over the oxide layer. A gate electrode is formed over the barrier layer. The barrier layer and gate electrode are configured to reduce the width of the depletion field absent a voltage applied to the gate electrode.
Public/Granted literature
- US20130140646A1 TRANSISTOR WITH REDUCED DEPLETION FIELD WIDTH Public/Granted day:2013-06-06
Information query
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