Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method involving a liquid confinement structure
- Patent Title (中): 涉及液体限制结构的平版印刷设备和器件制造方法
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Application No.: US12725883Application Date: 2010-03-17
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Publication No.: US08817231B2Publication Date: 2014-08-26
- Inventor: Jacobus Johannus Leonardus Hendricus Verspay , Hans Jansen , Marco Koert Stavenga
- Applicant: Jacobus Johannus Leonardus Hendricus Verspay , Hans Jansen , Marco Koert Stavenga
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/32
Abstract:
In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Public/Granted literature
- US20100177292A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-07-15
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