Invention Grant
- Patent Title: Off-axis silicon carbide substrates
- Patent Title (中): 离轴碳化硅衬底
-
Application No.: US12966753Application Date: 2010-12-13
-
Publication No.: US08823014B2Publication Date: 2014-09-02
- Inventor: James Edgar , Michael Dudley , Martin Kuball , Yi Zhang , Guan Wang , Hui Chen , Yu Zhang
- Applicant: James Edgar , Michael Dudley , Martin Kuball , Yi Zhang , Guan Wang , Hui Chen , Yu Zhang
- Applicant Address: US KS Manhattan US NY Albany GB Bristol
- Assignee: Kansas State University Research Foundation,State University of New York Stony Brook,The University of Bristol
- Current Assignee: Kansas State University Research Foundation,State University of New York Stony Brook,The University of Bristol
- Current Assignee Address: US KS Manhattan US NY Albany GB Bristol
- Agency: Lathrop & Gage LLP
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
A method of epitaxial growth of a material on a crystalline substrate includes selecting a substrate having a crystal plane that includes a plurality of terraces with step risers that join adjacent terraces. Each terrace of the plurality or terraces presents a lattice constant that substantially matches a lattice constant of the material, and each step riser presents a step height and offset that is consistent with portions of the material nucleating on adjacent terraces being in substantial crystalline match at the step riser. The method also includes preparing a substrate by exposing the crystal plane; and epitaxially growing the material on the substrate such that the portions of the material nucleating on adjacent terraces merge into a single crystal lattice without defects at the step risers.
Public/Granted literature
- US20110220915A1 Off-Axis Silicon Carbide Substrates Public/Granted day:2011-09-15
Information query
IPC分类: