发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US13287733申请日： 2011-11-02
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公开(公告)号： US08823920B2公开(公告)日： 2014-09-02
- 发明人: Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
- 申请人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP03254466 20030716
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/52 ; G03F7/20
摘要：
An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
公开/授权文献
- US20120044468A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日：2012-02-23