发明授权
- 专利标题: Apparatus for fabricating thin film transistor array substrate
- 专利标题(中): 用于制造薄膜晶体管阵列基板的装置
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申请号: US12880761申请日: 2010-09-13
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公开(公告)号: US08828149B2公开(公告)日: 2014-09-09
- 发明人: Oh Nam Kwon , Heung Lyul Cho
- 申请人: Oh Nam Kwon , Heung Lyul Cho
- 申请人地址: KR Seoul
- 专利权人: LG Display Co., Ltd
- 当前专利权人: LG Display Co., Ltd
- 当前专利权人地址: KR Seoul
- 代理机构: McKenna Long & Aldridge
- 优先权: KR10-2003-0071082 20031013
- 主分类号: G03F7/26
- IPC分类号: G03F7/26 ; G03F7/42 ; H01L27/12
摘要:
The present invention relates to an apparatus and a method of fabricating a thin film transistor array substrate. The apparatus includes a dip strip part for stripping a photo-resist pattern and a thin film formed on a substrate by using a stripper; a removing part for removing residual photo-resist and thin film from the substrate; and a jet strip part for jetting the stripper to remove residual particles of photo-resist and thin film left on the substrate. The method of fabricating includes dipping a substrate in a stripper, wherein the substrate has a photo-resist pattern and a thin film, the thin film being formed on an entire surface of the substrate so as to cover the photo-resist pattern; removing residual photo-resist and thin film using the stripper; and removing particles of residual photo-resist and thin film left on the substrate.
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