发明授权
- 专利标题： Light-emitting device and method for manufacturing the same
- 专利标题（中）： 发光装置及其制造方法
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申请号： US13209827申请日： 2011-08-15
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公开(公告)号： US08828757B2公开(公告)日： 2014-09-09
- 发明人: Chih-Yuan Lin , Shih-Yi Lien , Cheng-Hsing Chiang , Chih-Hung Pan
- 申请人： Chih-Yuan Lin , Shih-Yi Lien , Cheng-Hsing Chiang , Chih-Hung Pan
- 申请人地址： TW Hsinchu
- 专利权人： Epistar Corporation
- 当前专利权人： Epistar Corporation
- 当前专利权人地址： TW Hsinchu
- 代理机构： Ditthavong & Steiner, P.C.
- 主分类号： H01L33/30
- IPC分类号： H01L33/30 ; H01L21/20 ; H01L21/329
摘要：
A light-emitting device and method for manufacturing the same are described. A method for manufacturing a light-emitting device comprising steps of: providing a growth substrate, wherein the growth substrate has a first surface and a second surface; forming a light-absorbable layer on the first surface of the growth substrate; forming an illuminant epitaxial structure on the light absorbable layer; providing a laser beam and irradiating the second surface of the growth substrate, wherein the laser beam wavelength is greater than 1000 nm; and removing the growth substrate.
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