发明授权
- 专利标题： Method for etching a material in the presence of solid particles
- 专利标题（中）： 在固体颗粒存在下蚀刻材料的方法
-
申请号： US13320618申请日： 2010-05-12
-
公开(公告)号： US08828872B2公开(公告)日： 2014-09-09
- 发明人: Francis Baillet , Nicolas Gondrexon
- 申请人： Francis Baillet , Nicolas Gondrexon
- 申请人地址： FR Grenoble Cedex FR Saint Matin d'Heres
- 专利权人： Institut Polytechnique de Grenoble,Universite Joseph Fourier
- 当前专利权人： Institut Polytechnique de Grenoble,Universite Joseph Fourier
- 当前专利权人地址： FR Grenoble Cedex FR Saint Matin d'Heres
- 代理机构： Edwards Wildman Palmer LLP
- 代理商 Steven M. Jensen; Stephen M. Rafferty
- 优先权： FR0953294 20090518
- 国际申请： PCT/FR2010/050928 WO 20100512
- 国际公布： WO2010/133787 WO 20101125
- 主分类号： H01L21/302
- IPC分类号： H01L21/302
摘要：
The invention relates to a method for etching a structure (1) including at least one material (4) to be etched, said method consisting in: selecting at least one chemical species that can react with the material (4) to be etched; selecting at least one soluble compound that can release this chemical species; producing a solution (11) containing the compound and a powder of particles or solid grains (13) in suspension; placing the material to be etched in the presence of the solution; and producing high-frequency ultrasounds in the solution, at at least one frequency, capable of generating active cavitation bubbles such that the chemical species is generated and reacts with the material to be etched, thereby producing a soluble compound or a precipitate.
公开/授权文献
信息查询
IPC分类:
