Invention Grant
- Patent Title: Polymer and photosensitive resin composition comprising the same
- Patent Title (中): 聚合物和包含其的感光性树脂组合物
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Application No.: US13452456Application Date: 2012-04-20
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Publication No.: US08829068B2Publication Date: 2014-09-09
- Inventor: Sunhwa Kim , Ho Chan Ji , Dongchang Choi , Han Soo Kim , Yoon Hee Heo , Changho Cho , Won Jin Chung
- Applicant: Sunhwa Kim , Ho Chan Ji , Dongchang Choi , Han Soo Kim , Yoon Hee Heo , Changho Cho , Won Jin Chung
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: KR10-2011-0037474 20110421
- Main IPC: A61F2/08
- IPC: A61F2/08 ; C08F32/00 ; C08F10/00
Abstract:
The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
Public/Granted literature
- US20130030077A1 POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME Public/Granted day:2013-01-31
Information query
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